Charles M. McKenna
Keine laufenden Positionen mehr
Karriereverlauf von Charles M. McKenna
Ehemalige bekannte Positionen von Charles M. McKenna
Unternehmen | Position | Beginn | Ende |
---|---|---|---|
Ibis Technology Corp.
Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Präsident | 01.05.2005 | 30.11.2007 |
AZENTA, INC. | Technik-/Wissenschafts-/F&E-Leiter | 01.01.2000 | 01.01.2003 |
Statistik
International
Vereinigte Staaten | 3 |
Operativ
Chief Tech/Sci/R&D Officer | 1 |
President | 1 |
Sektoral
Health Services | 2 |
Electronic Technology | 2 |
Besetzte Positionen
Aktive
Inaktive
Börsennotierte Unternehmen
Private Unternehmen
Unternehmensverbindungen
Börsennotierte Unternehmen | 1 |
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AZENTA, INC. | Health Services |
Private Unternehmen | 1 |
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Ibis Technology Corp.
Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Electronic Technology |
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